LRCX - Lam Research Corporation

NasdaqGS - NasdaqGS Precio en tiempo real. Divisa en USD

Lam Research Corporation

4650 Cushing Parkway
Fremont, CA 94538
United States
510-572-0200
http://www.lamresearch.com

SectorTechnology
SectorSemiconductor Equipment & Materials
Empleados a tiempo completo9.800

Ejecutivos clave

NombreTítuloPagaEjecutadoEdad
Mr. Martin B. AnsticePres, CEO & Director3,38MN/A51
Mr. Douglas R. BettingerExec. VP, CFO & Chief Accounting Officer1,43MN/A51
Mr. Timothy M. ArcherExec. VP & COO1,82M7,27M51
Dr. Richard A. GottschoExec. VP & Corp. CTO1,41M4,3M66
Ms. Sarah A. O'Dowd Esq.Sr. VP, Chief Legal Officer & Sec.1,06MN/A68
Los importes son a partir de 31 de diciembre de 2017 y los valores de compensación son para el último año fiscal que finaliza en esa fecha. Paga es el salario, las bonificaciones, etc. Ejecutado es el valor de las opciones ejecutadas durante el año fiscal. Divisa en USD.

Descripción

Lam Research Corporation designs, manufactures, markets, refurbishes, and services semiconductor processing equipment used in the fabrication of integrated circuits worldwide. The company offers thin film deposition products, including SABRE electrochemical deposition products for copper damascene manufacturing; ALTUS systems to deposit conformal atomic layer films for tungsten metallization applications; VECTOR plasma-enhanced chemical vapor deposition (CVD) and atomic layer deposition systems to deposit oxides, nitrides, and carbides for hardmasks, multiple patterning films, anti-reflective layers, multi-layer stack films, and diffusion barriers; and Striker atomic layer deposition systems that deliver conformal dielectric films for spacer-based patterning and liner applications in various advanced memory and logic structures. Its thin film deposition products also comprise SPEED high-density plasma CVD products for applications in shallow trench isolation, pre-metal dielectrics, inter-layer dielectrics, inter-metal dielectrics, and passivation layers; and SOLA ultraviolet thermal processing products for treatment of back-end-of-line (BEOL) low-k dielectric films and front-end-of-line silicon nitride strained films. In addition, the company offers plasma etch products, such as Kiyo that provide solutions for conductor etch applications; Versys metal products, which offer a platform for BEOL metal etch processes; Flex for dielectric etch applications; and Syndion to address various through-silicon via etch and complementary image sensor etch applications. Further, it provides single-wafer clean products comprising EOS, Da Vinci, DV-Prime, and SP series products for wet etch and clean applications in wafer-level packaging; and Coronus plasma-based bevel clean products to enhance die yield by removing particles, residues, and unwanted films from the wafer's edge, as well as legacy products. The company was founded in 1980 and is headquartered in Fremont, California.

Gobierno corporativo

El ISS Governance QualityScore de Lam Research Corporation, a día 1 de enero de 2018, es 1. Las puntuaciones base son Auditoría: 1; Tablero: 4; Derechos de los accionistas: 2; Compensación: 2.

Puntuación de gobierno corporativo cedida por Institutional Shareholder Services (ISS). Las puntuaciones indican un rango decil relativo al índice o región. Una puntuación decil de 1 indica un menor riesgo de gobierno, mientras que un 10 indica un riesgo de gobierno superior.
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